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1 July 2008


AWR and UMS launch PDK for GaAs MMIC foundry process

A process design kit (PDK) from Applied Wave Research Inc (AWR) of El Segundo, CA, USA, which supplies high-frequency electronic design automation (EDA) products, has been introduced for the PPH25X GaAs pseudomorphic high-electron-mobility transistor (pHEMT) foundry process of United Monolithic Semiconductors (UMS) of Paris, France. PPH25X is dedicated to the design of monolithic microwave integrated circuits (MMIC) at frequencies up to 35GHz. The PDK lets users take advantage of the fabrication capabilities of UMS together with AWR’s Microwave Office design suite.

The PPH25X process has been developed specifically for high-frequency (45GHz Ft) and high-power designs and is fully qualified by UMS. It features very high breakdown voltage that achieves a power density of up to 1W per mm of gate periphery (load-pull power measurements exhibit 5dB power gain at 30GHz for a large 8µm x 75µm periphery). Small via-hole definitions through the 70µm substrate can be connected directly to the sources of the transistors, reducing parasitics and simplifying wideband amplifier design.

AWR says that its Microwave Office design environment is suited to MMIC development. The software integrates in one seamless environment all the tools that are essential for high-frequency design: linear and nonlinear circuit simulators, electromagnetic (EM) analysis tools, integrated schematic and layout, statistical design capabilities, and parametric cell libraries with built-in design-rule check (DRC). The design suite further provides a complete front-to-back flow and the ability to integrate third-party tools, delivering an intuitive, open, and interoperable environment, the firm claims.

See related items:

AWR and WIN announce next-generation PDKs for MMIC design

AWR and TriQuint launch Project JumpStart for GaAs MMIC designs