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18 November 2009


France’s STnano research center orders OIPT plasma etch & dep system

UK-based etch and deposition equipment maker Oxford Instruments Plasma Technology (OIPT) has won a contract to supply a Plasmalab System80 Plus ICP system to the research center STnano in Strasbourg, France.

STnano is the new Strasbourg nanofabrication platform, established jointly by IPCMS (a CNRS lab) and the University of Strasbourg (UdS), and has expertise in the design of nanostructures through top-down methods as well as in the study of their magnetic properties.

Oxford Instruments says that its Plasmalab System80Plus is a flexible and compact system for plasma etching and deposition processes. STnano has purchased the inductively coupled plasma (ICP) configuration in order to process multiple materials including silicon etch. The Plasmalab System80Plus is also available configured for etching and deposition (ICP-PECVD), reactive ion etching (RIE), plasma etching (PE) or plasma-enhanced chemical vapor deposition (PECVD).

“We demanded the highest-specification system we could find to fit the specifications for the work we are undertaking,” says STnano’s nanofabrication manager Dr Hicham Majjad. “The Plasmalab80 Plus open load design allows for fast loading and unloading, ideal for prototyping and low-volume production environments such as ours.”

The system has been bought as part of the STnano’s program to equip its cleanroom for nano- and micro-scale fabrication in the fields of molecular electronics, spintronics, and polymers.

See related item:

OIPT wins three-system order from Melbourne Centre for Nanofabrication

See: Oxford Instruments Company Profile

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