29 April 2010


University of Waterloo orders multiple OIPT systems

UK-based etch and deposition equipment maker Oxford Instruments Plasma Technology (OIPT) recently received a multi-system order from the University of Waterloo, Ontario, Canada. The order consists of OIPT’s System100 ICP & System133 PECVD, and a FlexAL PECVD/ALD Cluster tool, with multi-wafer batch capability and the potential for providing a number of process applications.

The equipment will be housed in the university’s cleanroom at the Mike and Ophelia Lazaridis Quantum-Nano Centre, a new building now under construction. Due for completion in 2011, the facility will be shared between the Institute for Quantum Computing and the Waterloo Institute of Nanotechnology.

OIPT says that its tools offer powerful stand alone and clusterable process modules, enabling a wide range of applications. The university will use its new systems for multiple process techniques, including: Bosch, cryo silicon etch, compound semiconductor, metal etch, and PECVD. In addition, one of the tools will be clustered to offer ALD process capability, to deposit Al2O3 conformal coating.

See: Oxford Instruments Company Profile

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