8 June 2010


Suss MicroTec introduces MA100e Gen2 automatic mask aligner for the production of HB-LEDs

Suss MicroTec of Garching, near Munich, Germany has introduced the next generation of its MA100e mask aligner, a dedicated lithography system for manufacturing high-brightness light emitting diodes (HB-LEDs).

Based on Suss MicroTec’s production proven mask aligner design, the automatic MA100e Gen2 processes wafers up to 4 inches and enables a throughput of 145 wafers per hour with reduced cycle times, says the firm. The MA100e Gen2’s high-intensity exposure optics and pre-alignment options shorten process time, while functionalities like proximity exposure for high resolution down to 2.5µm maximize yield and cost-efficiency.

“We have clearly noted the growing demand for sophisticated HB-LED technology and see the trend towards lower cost of ownership resulting from higher automation in the LED industry”, said Frank Averdung, president and CEO of Suss MicroTec. ”With the next generation of the MA100e SUSS MicroTec has developed a highly efficient automatic mask aligner solution for LED production that helps our customers to cut down cost per lumen and increase their production efficiency.”

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