4 May 2010


Oxford Instruments announces Nanoscale Plasma Processing Workshop

UK-based etch and deposition equipment maker Oxford Instruments Plasma Technology (OIPT) has announced that it is to hold a Nanoscale Plasma Processing Workshop, in Glasgow on 30th June 2010. The seminar's wide programmes will include talks by OIPT applications and development scientists, in addition to key guest speakers, and speakers from the University of Glasgow.

Nanoscale Plasma Processing Workshop

Wednesday 30th June 2010

Presented by:                                    

Glasgow James Watt Nanofabrication Centre & Oxford Instruments Plasma Technology

Venue:  University of Glasgow

Timing:  9.30am – 4.30pm                                                                       
Presentations, Discussions, Laboratory Tour and a networking lunch

This one day seminar will focus on the latest innovations in Atomic Layer Deposition, silicon and III-V Etch. Programme includes:

  • Welcome Introduction to the Glasgow James Watt Nanofabrication Centre.
  • Prof Douglas Paul,  Dept of Electrical & Electronics Engineering,  University of Glasgow: III-V Etching – Nanoscale and low damage.
  • Dr Ligang Deng, OIPT: Introduction to Kelvin Nanotechnology.
  • High resolution patterning and etching.
  • Dr Alex Robinson, University of Birmingham:
    Introduction to ALD – materials and applications.
  • Chris Hodson, OIPT.
  • Challenges for Atomic Layer Deposition for CMOS devices with high mobility channel materials.
  • Annelies Delabie, IMEC: Silicon Etch – Alternative processes.
  • Bob Gunn/Colin Welch, OIPT.
  • Closing remarks and questions.
  • Prof Douglas Paul & Dr Haiping Zhou, Dept of Electrical & Electronics Engineering,  University of Glasgow: Networking Tea.
  • Cleanroom tours

For further information or to book a place on this Workshop please contact: Claire Kiermasz, Oxford Instruments Plasma Technology. Email:       

Other seminars in this series include:

15-16 July 2010: New Frontiers in Plasma Nanopatterning

Hosted by The Molecular Foundry, Lawrence Berkeley National Laboratory, CA, USA (Semicon West week).

27-28 September 2010: Dry processing for Nanoelectronics and Micromechanics: growth, deposition and etching

Hosted by University of Freiburg/IMTEK, Germany.

See: Oxford Instruments Company Profile

Search: OIPT Etch PECVD


Programmes and registration