6 April 2011

Mass spectrometers for thin films, plasma and surface engineering

Hiden Analytical of Warrington, UK has released a new brochure detailing its range of mass spectrometer products developed specifically for specialized vacuum process applications under diverse pressure regimes, from sub-atmospheric to ultra-high vacuum.

The application-specific systems are configured for monitoring, controlling and analysing varied processes related to thin-film deposition, to plasma and ion beam etching, and to thermal reaction and desorption processes. Systems are available for real-time measurement of gas composition and of both positive and negative plasma ion species and ion energies, supplied fully engineered with a dedicated process interface.

Applicable process techniques include atomic layer deposition (ALD), chemical vapor deposition (CVD) and metal-organic chemical vapor deposition (MOCVD), molecular beam epitaxy (MBE), reactive ion etching (RIE) and ion beam etching (IBE)/reactive ion beam etching (RIBE).

Combined secondary-ion and secondary-neutral mass spectrometers (SIMS/SNMS) provide post-process quantitative measurement of product surface and subsurface composition. The systems are supplied as complete workstations and also in component form for the upgrade of existing ultrahigh-vacuum (UHV) surface analysis tools.

E-mail info@hiden.co.uk for a copy of the brochure.

Tags: Hiden Analytical Mass spectrometer

Visit: www.HidenAnalytical.com

Join Semiconductor Today's LinkedIn networking and discussion group

See Latest IssueRSS Feed