18 January 2011

OIPT supplies plasma systems to Midwest Institute for Nanoelectronics Discovery

UK-based equipment maker Oxford Instruments Plasma Technology (OIPT) says that, to further expand and facilitate its research capabilities, the Midwest Institute for Nanoelectronics Discovery (MIND) has purchased two plasma etch and deposition systems. The FlexAL atomic layer deposition (ALD) system and the PlasmaPro System100 ICP etch system will be installed in the Notre Dame Nanofabrication Facility, a 9000 square foot cleanroom in the Stinson-Remick Hall of Engineering on the campus of the University of Notre Dame, IN, USA.

OIPT says that FlexAL systems provide flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma ALD processes and thermal ALD within a single system. The PlasmaPro System100 ICP etch system features the new Cobra source, which provides additional plasma control capabilities, providing high flexibility for advanced processing.

MIND is one of four centers sponsored by Semiconductor Research Corp’s Nanoelectronics Research Initiative (NRI). Collaborations also link MIND to the US National Institute of Standards and Technology (NIST), Argonne National Laboratory, and the National High Magnetic Field Laboratory.

“The goal of the NRI centers is to discover and develop the next nanoscale logic device — one with performance capabilities beyond conventional devices, enabling it to become the basic building block of future computers,” says professor Alan Seabaugh of Notre Dame, the Frank M. Freimann director of MIND. “At Notre Dame, we have chosen Oxford Instruments’ systems to facilitate this work, due to the advanced features they provide; the versatility and cost effectiveness of their systems for research and the support the company offers,” he adds.

See: Oxford Instruments Company Profile

Tags: OIPT ALD FlexAL PlasmaPro System100 ICP

Visit: www.oxford-instruments.com

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