19 October 2011

Edwards’ new iXH500H dry pump series cuts CoO by 30%

Vacuum and exhaust-abatement equipment maker Edwards Ltd of Crawley, UK has expanded its iXH family of harsh-process dry pumps by introducing the iXH500H series, optimized for flat-panel, solar and advanced semiconductor processes requiring high gas flows (up to 500m3/h) and flexible pump temperature profiles.

The iXH500H series temperature flexibility suits such harsh processes, the firm claims. Running at low pump temperatures, the iXH500H series is beneficial for processes that use high flows of corrosive gases (e.g. FPD PECVD, thin-film solar PECVD, semiconductor MOCVD) or for processes that use thermally sensitive pre-cursors (e.g. atomic layer deposition) that could ‘plate out’ by-products within the pump. High operating temperatures can be used where the risk is the condensation of by-products within the pump (e.g. high-k dielectric deposition).

“This new series in the iXH family is designed to address the varying pumping challenges encountered in flat-panel, solar and advanced semiconductor processes that can significantly reduce a pump’s MTBS [mean time between servicing],” says Dr Allister Watson, drypump product manager-FPD & Solar Sectors. “Until now, the industry lacked a single harsh-process dry pump with the flexibility to address these different challenges,” he adds. “The iXH500H series, with its increased pump temperature flexibility, addresses this need, while also reducing pump energy consumption by up to 15%.” 

The firm claims that, due to lower energy consumption and enhanced MTBS, the iXH500H series pumps can yield a 30% lower cost of ownership (compared with previous-generation iXH dry pumps) while delivering the small footprint and hydrogen pumping capabilities of the existing iXH450 series.

Also available are service upgrades to convert existing iXH450 series pumps to the new iXH500H series.

Tags: Edwards Dry pump MOCVD

Visit: www.edwardsvacuum.com

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