5 April 2012

China’s Fujian Institute of Research receives Aixtron CCS reactor for telecom laser R&D

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that in first-quarter 2012 it delivered a CCS R&D metal-organic chemical vapor deposition (MOCVD) reactor in 6x2-inch wafer configuration (ordered in third-quarter 2011) to new customer FJIRSM (the Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences).

A service support team from Aixtron China Ltd has installed the reactor in a new cleanroom at the FJIRSM Laser Laboratory, where it will be used for telecom diode laser research.

“After having evaluated the MOCVD market thoroughly, we established that Aixtron offers worldwide the best currently available equipment for our purposes,” comments FJIRSM’s fab director Dr Su. “Our engineers were very impressed with the ease of operation, run-to-run and wafer-to-wafer uniformity of the CCS system. It is undoubtedly the most suitable platform for the development of the long-wavelength lasers for applications in telecom, datacom, and sensor networks that interest us.”

FJIRSM research is focused on laser engineering and technology, promoting the development of novel key cell technology for solid-state laser and systems integration technology, laser crystals and nonlinear optical crystal material exploration, and engineered growth technology.

FJIRSM was founded in 1960 and is one of the most influential and comprehensive research bases in China. Specializing in structural chemistry and new crystal materials, it consists of eight laboratories. Major provincial scientific and technology projects led by FJIRSM have included: ‘New Materials and Devices’, ‘Optoelectronic Information Materials and Devices’, and ‘Solar Energy Electron Materials and Devices’.

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Tags: Aixtron MOCVD Telecom diode laser

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