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9 November 2012

Brolis receives Veeco MBE system ready for opening of new epitaxial wafer facility

Brolis Semiconductors Ltd of Vilnius, Lithuania says it has received shipment of a Veeco GEN200 Edge molecular beam epitaxy (MBE) production system from Veeco Instruments Inc of Plainview, NY, USA. The system will be installed at Brolis’ new epitaxial wafer production facility in Vilnius, which is due to open on 5 December. Brolis specializes in mid-infrared type-I GaSb laser diodes and MBE, manufacturing epitaxial wafers for antimonide and arsenide materials for thermal imaging focal plane arrays, CPV and custom devices.

“The mission of our company is to become a world-leading provider of complex epitaxial structures for long-wave optoelectronics, such as thermal imaging, concentrator photovoltaic and other custom devices,” says Brolis’ CEO Dominykas Vizbaras. “Veeco is the world’s leading provider of production MBE systems, so we anticipate that the GEN200 will enable us to be extremely competitive in terms of wafer quality, speed to market, and cost effectiveness of our products,” he adds.

“We are pleased Brolis has chosen Veeco as their MBE equipment supplier as they open their new state-of-the-art epitaxial manufacturing fab,” a Jim Northup, VP & general manager of Veeco’s MBE Operations. “The GEN200 will support Brolis’ market penetration goals with its production-proven performance and the industry’s lowest cost of ownership.”

Veeco says that the GEN200 Edge system is the most cost-effective and highest-capacity multi-4" production MBE system on the market, and delivers superior throughput, long campaigns and excellent wafer quality in growing epitaxial wafers for custom devices.

Tags: Brolis Veeco MBE



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