Temescal

ARM Purification

CLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIACLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIA

Join our LinkedIn group!

Follow ST on Twitter

IQE

11 February 2014

Momentive expands manufacturing capacity for tantalum carbide coatings

Momentive Performance Materials Quartz Inc (MPM) has increased and expanded its manufacturing capacity of tantalum carbide coatings (TaC) in response to the growing demand for silicon carbide (SiC) power devices and the increased need for improved dimensional control for gallium nitride (GaN) LEDs. TaC coatings are used in metal-organic chemical vapor deposition (MOCVD) systems for the production of GaN and SiC devices.

With the expansion, MPM has the capability to produce up to 750mm-diameter parts, compared with the previous 500mm limitation. The diameter increase can help to enable next-generation SiC epi tools and can provide improved dimensional control for the current GaN tools now using alternate protective coatings, says MPM.

MPM’s TaC is manufactured using a proprietary coating process, which yields resistance to hot hydrogen during epitaxial processes. SiC coatings can start to decompose at 1200-1400°C, whereas TaC generally is stable to over 2000°C. Also, the coatings can provide what is claimed to be exceptional dimensional control and hence a uniform and conformal coating, even on wafer pockets and complex shapes.

MPM is an indirect subsidiary of specialty chemicals and materials provider Momentive Performance Materials Inc of Columbus, OH, USA.

Tags: Momentive

Visit: www.Momentive.com

Share/Save/Bookmark
See Latest IssueRSS Feed

EVG