15 July 2014

Riber sells third Compact 21 DZ research MBE system

Riber S.A. of Bezons, France, which manufactures molecular beam epitaxy (MBE) systems as well as evaporation sources and effusion cells, says it has received a purchase order for a third Compact 21 DZ research MBE system.

Previously, two systems were sold during first-half 2014, following the commercial launch of the Compact 21 DZ on the market at the end of 2013.

The system will enable a ‘leading European laboratory’ to increase its development capabilities for designing III-V semiconductor devices.

The Compact 21 DZ system is designed specifically for fundamental research on new compound semiconductors, particularly structures based on III-V, II-VI, gallium nitride (GaN) materials, graphene, oxides, etc. Riber says that it is suited to the development of emerging technologies, such as UV LEDs or high-performance solar cells. Compact and flexible, the system is designed to meet the needs of users aiming to minimize their fixed costs.

See related items:

Riber adds Compact 21 DZ to its range of research MBE systems

Tags: Riber MBE

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