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11 February 2015

Fraunhofer IAF buys Veeco K465i MOCVD system for nitride-based R&D

Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that the Fraunhofer Institute for Applied Solid State Physics IAF of Freiburg, Germany has purchased a TurboDisc K465i gallium nitride (GaN) metal-organic chemical vapor deposition (MOCVD) system. 

Fraunhofer develops electronic and optoelectronic devices based on III-V micro- and nanostructures for applications such as security, energy, communication, health and mobility.

"After more than a decade of research in the field of nitride epitaxy on sapphire, silicon and silicon carbide (SiC) substrates, we have decided to upgrade our operation to include Veeco's MOCVD technology," says Fraunhofer IAF deputy director Dr Martin Walther, head of the Epitaxy Department. "The K465i offers a clean process and exceptional run-to-run repeatability that will enable us to achieve new levels of development in high-growth markets," he adds.

Veeco says that K465i MOCVD systems feature excellent film quality, low defects and high productivity, which are key for effective GaN processing. The system also incorporates the firm's Uniform FlowFlange technology for superior uniformity and run-to-run repeatability. Since its introduction in 2010, the K465i has been the top selling MOCVD system worldwide, says Veeco.

"We strive to provide innovative process solutions, including the recent introduction of the Propel PowerGaN MOCVD system for power electronics devices," says Jim Jenson, senior VP, general manager, Veeco MOCVD.


Visit: www.iaf.fraunhofer.de/en.html

Visit: www.veeco.com

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