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24 March 2015

Picosun establishes joint industrial ALD research lab at Taiwan's NCTU

Taiwan's National Chiao Tung University (NCTU) and atomic layer deposition (ALD) equipment maker Picosun Oy of Espoo, Finland have established a Joint Industrial ALD Research Laboratory at the premises of the X-Photonics Interdisciplinary Center at NCTU to use ALD technology to realize a new generation of micro- and optoelectronic devices.

Through the collaboration, NCTU and Picosun aim to develop a wide range of interdisciplinary technology solutions for applications such as microelectronic devices for the 7nm technology node, high-brightness light-emitting diodes (HBLEDs), and high-electron-mobility transistors (HEMT). Both fundamental research and advanced device fabrication for industrial applications will be the core objectives of the lab.

"Picosun, with their world-leading experience in ALD system design and process knowhow, has been chosen as our ALD technology provider," says professor Hao-Chung Kuo, associate VP of NCTU, and a fellow of both the Institute of Electrical and Electronic Engineers (IEEE) and the Optical Society of America (OSA).

"Establishing a partnership and a joint research laboratory with NCTU will provide our existing and future industry customers not only local access to our technology for their applications, but also stronger collaboration ties for future-generation products enabled by our ALD technology," says Dr Wei-Min Li, CEO of Picosun Asia and applications director of Picosun Group. "This is further supported by our newest subsidiary, Picosun Taiwan, which was established two months ago," he adds.

See related items:

Picosun launches 150-200mm wafer batch ALD system for LEDs, MEMS and power devices

Tags: ALD

Visit: www.nctu.edu.tw

Visit: www.picosun.com

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