ARM Purification

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15 March 2019

Edwards launches iXH Mk2 dry pump for ultra-harsh processes

Vacuum and exhaust-abatement equipment maker Edwards of Burgess Hill, UK has lauched the iXH Mk2 Series – a high-efficiency, low-power, ultra-harsh-duty dry pump addressing both existing semiconductor process requirements and future emerging application challenges in semiconductor, display, LED and solar PV manufacturing processes including high-k, low-k, subatmospheric chemical vapor deposition SACVD, low-pressure chemical vapor deposition (LPCVD), atomic layer deposition (ALD), transparent conducting oxide (TCO), gallium nitride (GaN) and epitaxy.

Edwards is showcasing the new iXH Mk2 in booth 1309 (FPD CHINA) at SEMICON China 2019 (20-22 March) at the Shanghai New International Expo Centre (SNIEC).

“The new iXH Mk2 dry pump provides an even longer service life than previous generations for the harshest of processes,” says product manager Al Brightman senior. “It can also provide significant improvements in power efficiency,” he adds. “Leveraging 100 years of technology innovation, we have ‘reset the bar’ for harsh process capability, reliability and low cost-of-ownership. The iXH reduces the environmental impact of some of the harshest processes used in semiconductor manufacturing.”

Tags: Edwards

Visit:  www.edwardsvacuum.com

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