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2 October 2019

OIPT supplies HLJ with plasma etch & dep systems for fabricating VCSELs on 6 inch wafers

UK-based plasma etch and deposition processing system maker Oxford Instruments Plasma Technology (OIPT) says that HLJ Technology Co Ltd of HsinChu, Taiwan has selected multiple Oxford Instruments inductively coupled plasma (ICP) etch and plasma-enhanced chemical vapor deposition (PECVD) systems on cluster platforms for the production of 6-inch vertical-cavity surface-emitting laser (VCSEL) wafers.

As a pioneer of VCSEL production in Taiwan, HLJ recently built a mass-production line for 6-inch VCSEL wafers to enhance efficiency and to expedite greater control of production lead-times, capacity and quality. The in-house line integrated epitaxial structure design, growth, wafer processes and reliability tests, as HLJ aims to provide a one-stop-shop for VCSEL devices for global customers.

“We chose Oxford Instruments to supply our ICP etch and PECVD systems because they offer cutting-edge plasma processing solutions and unrivalled process support, which will be invaluable to us,” comments HLJ’s general manager Dr Lai. The Cobra ICP and PECVD process solutions are designed to support leading-edge device fabrication such as VCSELs.

“We continue to strengthen our position as a solution provider for compound semiconductors, including the VCSEL market,” says Oxford Instruments’ CEO Dr Ian Barkshire. “This partnership reinforces our commitment to enhance market-leading production capabilities.”


Visit: www.hlj.com.tw

Visit: www.oxford-instruments.com/plasma

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