News

19 June 2006

 

Veeco to co-develop oxide-on-silicon MBE technology

Veeco Instruments Inc of Woodbury, NY, USA has received two orders for its GEN200 molecular beam epitaxy system.

The first order is from IPG Photonics, which designs, manufactures and sells fiber lasers and amplifiers and diode lasers for applications in the materials processing, telecom, medical, aerospace, government and scientific markets. The company will use the system for the production of high-quality GaAs-based lasers.

The second order is from a ‘multi-billion dollar electronics
manufacturer’, and includes a technology collaboration using a GEN200 at Veeco's St. Paul, Minnesota MBE Process Integration Center (PIC) that is focused on depositing oxide films on silicon wafers with MBE technology. The process development will occur in parallel to the
manufacturing of an identical system that will be delivered to the customer after completion of the process development.

Jeffrey Hohn, VP and General Manager, Veeco MBE Operations, commented:"These orders signify further adoption of Veeco's cluster-based systems for production applications. Our PIC provides customers with the unique ability to qualify production processes scaled from research systems and to work together to expand MBE technology to new materials and substrates."

The GEN200 MBE system has a cluster tool design that provides 4x4" epiwafer growth of devices such as pump lasers, vertical cavity surface-emitting lasers (VCSELs) and heterojunction bipolar transistors (HBTs). Its cluster tool architecture minimizes cleanroom space, increases throughput, and allows for growth of different materials in
connected modules, says Veeco.

Visit: http://www.veeco.com