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11 June 2007


Advanced Photonix opens consolidated silicon and III-V opto fab

Advanced Photonix Inc, a vertically integrated designer and manufacturer of photodetectors, subsystems, and terahertz systems, has completed its new multi-million dollar, 5000 square foot microfabrication facility for R&D and manufacturing of optoelectronic devices.

The facility consolidates the firm’s two microfabrication operations in Camarillo, CA and Dodgeville, WI, which produced silicon photodiodes in PIN, large-area APD (LAAPD) and FILTRODE detector configurations , into one centralized facility at its subsidiary Picometrix LLC in Ann Arbor, MI, USA (acquired in 2005) which, since 1992, has used MBE to produce standard and customized InGaAs and InP high-speed optical receivers in APD and PIN configurations (currently with bandwidths of 2-60GHz and wavelengths of 700-1650nm for 10-40Gbps applications).

The consolidation is aided by up to $1.2m of tax incentives: a Single Business Tax credit worth more than $1.1m over 10 years from the State of Michigan, approved by the Michigan Economic Development Corporation (MEDC); and a personal property tax abatement of up to $94,000 over a five-year period from the City of Ann Arbor. The project is expected to create 105 direct and indirect jobs over a 10 year period.

The consolidation should improve efficiency, enhance technology development and reduce costs, says chairman and CEO Rick Kurtz.