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24 September 2007


WIN orders second Vistec e-beam writer

WIN Semiconductors Corp, a 6" GaAs RFIC/MMIC wafer foundry in Tao Yuan Shien, Taiwan, recently placed an order with Vistec Electron Beam GmbH of Jena, Germany (formerly Leica Microsystems) for a SB250 Variable Shaped Beam system.

The electron-beam lithography system will be delivered and installed in 2008, and used for the production of pHEMT components (mainly for telecoms and satellite transmission applications).

The order represents a follow-on purchase of a Vistec Shaped Beam system by WIN. “This second electron-beam lithography system from Vistec will help us to meet not only current production demands, but also develop products featuring 100nm gate length,” said Dr Der-Wei Tu, senior VP and chief technology advisor at WIN .

“This again proves that our direct-write technology has been validated in advanced production environment,” said Wolfgang Dorl, Vistec Electron Beam’s general manager.

See related items:

WIN opts for Aixtron AIX 2600G3 IC system for production of triple junction solar cells

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