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13 November 2006


Bandwidth expands wafer production with multiple Veeco TurboDisc E450 As/P MOCVD systems

Bandwidth Semiconductor LLC, a subsidiary of Spire Corporation, has purchased multiple Veeco TurboDisc E450 As/P Metal Organic Chemical Vapor Deposition (MOCVD) Systems.

Edward D. Gagnon, general manager of Bandwidth Semiconductor LLC, said, "The addition of Veeco’s TurboDisc MOCVD systems is critical as we scale up our existing MOCVD and related processing facilities to satisfy production demands. After reviewing competitive systems, it was clear the high production throughput of Veeco’s MOCVD systems will allow us to meet our customer requirements for VCSELs, LEDs and concentrator solar cells.”

According to Veeco, Bandwidth will use the systems to produce III/V and II/VI wafers for a customer who makes eVCSELs (vertical cavity surface emitting lasers) as a light source for projection display applications, including rear-projection consumer television (RPTV).

Engineered for the high-volume production of compound semiconductor materials, Veeco's TurboDisc As/P tools offer integrated RealTemp 200 technology for direct wafer temperature control, and fast gas switching for strict control of interface abruptness. The E450 is Veeco’s largest capacity MOCVD production system, making it suitable for the mass production of ROY HB-LEDs, HBTs, pHEMTs, and multi-junction solar cells.

Piero Sferlazzo, VP and general manager of Veeco's MOCVD operations, said: “Veeco is pleased to support Bandwidth in its expansion.”

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