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10 October 2006


Photolithography for HB-LEDs 

Suss MicroTec of Munich, Germany has recently received further orders for its LithoFab200 clusters from Osram Opto Semiconductors. The systems will be used for high volume manufacturing of HB-LEDs.

The LithoFab200 cluster system consists of coat, bake, align, expose and develop cells and has been selected by Osram for its ability to safely handle fragile substrates, says Suss. Based on the MA200Compact Mask Aligner, a newly designed exposure cell optimizes alignment accuracy. Suss’ DirectAlign option allows for an alignment accuracy down to 0.5 micron (3 sigma), the highest performance available for a mask aligner, according to the company.