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23 September 2006


Trion Technology introduces new photoresist stripper

Founded in 1989, Trion Technology Inc of Clearwater, FL, USA supplies a variety of plasma etch and deposition equipment for the manufacturing of compound semi- conductors, MEMS, and optoelectronics.

Recently, the company introduced a new microwave photoresist stripping system. The Apollo is a compact, inexpensive and versatile system, which can handle 100-300mm wafers, says the company. It has an etch rate of 6um /min. By employing both microwave and RF bias power as needed, difficult to remove layers of resist can be removed at low temperatures. The system also incorp- orates the SST-Lightning microwave source, which according to Trion is totally free from typical microwave tuning problems.

Trion can be found on booth 5075 at next week’s NanoTX event in Dallas, TX, USA.

Contact: info@triontech.com

Visit: http://www.triontech.com