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28 November 2008


TEL and Edwards co-developing PFC abatement system for dielectric etch

Vacuum and exhaust management equipment maker Edwards of Crawley, UK and Japanese process equipment maker Tokyo Electron Ltd (TEL) are to jointly develop a perfluorocarbon (PFC) gas abatement system for dielectric film etching equipment. The new PA-01E gas abatement system will be available in mid-2009.

“The contribution of PFC gases to global warming has been extensively documented, and we look forward to working with TEL’s engineering staff to provide an effective, low cost-of-ownership gas abatement system specifically designed to reduce the dangers of PFC pollution as a result of the semiconductor etch process,” says Edwards’ CEO Nigel Hunton.

The PA-01E system will be equipped with a plasma abatement device, collectively developed with Adtec Plasma Technology Co Ltd of Hiroshima, Japan, which offers a high transformation rate and stable operation. It is also designed to have a significantly lower cost-of-ownership due to its reduced requirement for energy, consumables and maintenance.

In addition, the system will be designed to abate carbon monoxide in addition to PFCs, eliminating the need for separate abatement hardware.

See related items:

Edwards launches iXH series of vacuum pumps for compound semiconductor and ALD processes

Edwards selling Kachina parts cleaning division to Applied

BOC Edwards re-brands as Edwards

BOC Edwards launches Spectra-G exhaust abatement system for MOCVD processes

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