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1 December 2009


Cambridge NanoTech sells plasma ALD systems to US national labs

Massachusetts-based Cambridge NanoTech Inc, which was spun off from Harvard University’s Gordon Lab in 2003, has sold three Fiji Series plasma atomic layer deposition (ALD) systems to three US national laboratories: the Naval Research Lab (NRL), the Air Force Research Lab (AFRL) and the Army Research Lab (ARL).

“These leading national labs are attracted to the flexibility offered by the Fiji, which in turn allows them to expand their materials and device engineering capabilities,” claims Dr Ganesh Sundaram, VP of technology.

The NRL plans to conduct research into the growth of oxides, metals and semiconductors, such as InGaN, which span temperatures ranging up to 1000°C. The materials are of interest to the US Navy because they promise improved performance in future communications, radar and power-management systems.

Research conducted on the Fiji at AFRL Wright-Patterson Air Force Base will be focused on the electrical properties of ultra-thin plasma-generated hafnium dioxide (HfO2) films, and ARL aims to use the Fiji to support electronic materials and device projects with conformal deposition of high-quality semiconductor, dielectric, and metal films.

“We have found that the Fiji’s combined capabilities of growing ultra-thin films with plasma-generated co-reactants and allowing in-situ film analysis, such as OES [optical emission spectroscopy], ellipsometry, Langmuir probes and QCM [quartz crystal microbalance], have been essential to the success of the system,” says Mark Sowa, senior research scientist for Cambridge NanoTech.

Fiji is on display at this week’s 2009 MRS Fall Meeting of the Materials Research Society in Boston, MA, USA.

See related item:

Tyndall buys Cambridge NanoTech plasma ALD system

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