16 February 2010


OIPT introduces CCD1 Spectrometer system

UK-based etch and deposition equipment maker Oxford Instruments Plasma Technology (OIPT) has introduced its CCD1 Spectrometer system, which the firm says improves the end-pointing capability of its plasma etch and deposition tools.

Capable of providing both a process end-pointing capability and UV/VIS spectrum capture, the CCD1 is available as a standard option on all new tools or as an upgrade option (dependent on system age, type, and configuration) for existing Oxford Instruments customers.

The CCD1 is a UV/VIS CCD spectrometer that can monitor a wide range of plasma emissions over wavelengths 200nm-880nm. It can be used in one of two ways: process endpoint detection via OIPT’s PC2000 software, or full spectrum viewing and recording. OIPT says that this provides the user with detailed plasma spectroscopy information, which can be used for monitoring the concentrations of species within the plasma. The spectra can also be compared to previous spectral data, for system monitoring, fault detection and potential fault classification.

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