16 June 2011

Tsinghua Tongfang adds Veeco's MaxBright MOCVD system to new NanTong fab

Epitaxial deposition, process, and metrology equipment maker Veeco Instruments Inc of Plainview NY, USA says that Tsinghua Tongfang Company Ltd of Beijing, China, a publicly listed division of Tsinghua Holdings Company Ltd, has ordered a new TurboDisc MaxBright multi-reactor gallium nitride (GaN) metal-organic chemical vapor deposition (MOCVD) system for the production of high-brightness light-emitting diodes (HB-LEDs).

“Last year we selected Veeco as our primary supplier for our new production facility in NanTong, China that was completed at the end of 2010,” says Nantong Tongfang general manager professor Liu Gang, adding that the firm is very pleased with the performance of Veeco’s single-chamber K465i systems and is now adding the multi-chamber MaxBright system to help further improve its fab’s productivity.

Tsinghua Tongfang was established and listed on the Shanghai Stock Exchange in 1997, and is engaged in information technology, energy and environment industries. “Tsinghua Tongfang has done a great job building their LED business, and we are extremely pleased to continue to support their further capacity expansion with our latest-generation product,” comments William J. Miller, Ph.D., executive VP, Veeco LED & Solar.

The MaxBright system is reckoned to be the industry’s most productive, lowest-cost-of-ownership MOCVD system available for manufacturing HB-LEDs. Available in a 2- or 4-reactor cluster architecture, the system delivers a productivity gain of up to 500% and a 2.5x increase in footprint efficiency over the K465i system, Veeco adds.

See related items:

FOREPI orders multiple Veeco MaxBright MOCVD systems

Genesis Photonics orders multiple Veeco MaxBright MOCVD systems

See: Veeco Company Profile

Tags: Veeco MOCVD GaN TurboDisc MaxBright LEDs Tsinghua Tongfang

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