6 October 2011

Tegal extends bid deadline for nanolayer deposition patent portfolio

Tegal Corp of Petaluma, CA, USA has extended the bid deadline for its Nanolayer Deposition Technology (NLD) intellectual property portfolio from 30 September to 15 October, 5pm PDT (pacific daylight time) after several additional IC and semiconductor equipment manufacturers expressed interest.

In March 2010, Tegal sold its legacy thin-film etch and physical vapor deposition (PVD) product lines to OEM Group Inc of Gilbert, AZ, USA for up to $3m. This February, it sold its deep reactive ion etch (DRIE) assets to plasma etch, deposition and thermal processing equipment maker SPP Process Technology Systems Ltd (SPTS) of Newport, Wales, UK. Now, through its investment in sequel Power, Tegal is engaged in the promotion of solar power plant development projects worldwide and other renewable energy projects.

Tegal says that NLD process technology bridges the gap between high-throughput, non-conformal chemical vapor deposition (CVD) and highly conformal, low-throughput atomic layer deposition (ALD). The portfolio includes more than 35 US and international patents in the areas of pulsed-CVD, plasma-enhanced ALD, and NLD.

“The NLD technology provides a number of options for meeting the needs of advanced semiconductor processing technology, particularly with the drive toward 3D structures,” says chief technologist Robert Ditizio. “Tegal’s NLD portfolio provides technology for extending the life of conventional CVD process hardware without the need to move completely to lower-throughput, precursor-limited ALD processes,” he adds.

See related items:

Tegal sets bid deadline for Nanolayer Deposition patent portfolio

SPTS buys Tegal’s DRIE assets

Tegal sells thin-film etch and PVD assets to OEM Group

Tags: Tegal NLD

Visit: www.Tegal.com

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