ARM Purification

CLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIACLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIA

Join our LinkedIn group!

Follow ST on Twitter


14 June 2016

IQE equips complete fab with LayTec tools for MOCVD process monitoring

In-situ metrology system maker LayTec AG of Berlin, Germany says that epiwafer foundry and substrate maker IQE plc of Cardiff, Wales, UK has purchased a large number of its latest metrology systems for fab-wide metal-organic chemical vapor deposition (MOCVD) process control.

In close collaboration with IQE, LayTec has implemented automated and highly precise new analysis algorithms into its Gen3 metrology tools, which utilize an updated x-ray diffraction (XRD) gauged high-temperature nk database of aluminium gallium arsenide (AlGaAs). This was the key to meeting the demands of the world's leading compound semiconductor wafer foundry, says LayTec. With its in-situ metrology, the fab's MOCVD systems can be tuned much more quickly to new and usually complex processes for best serving IQE's large customer base, it adds.

"As the global leader in wafer outsourcing, IQE is committed to deliver the highest product quality standards to its customers," says IQE's engineering & operations director Matthew Geen. "LayTec's new unrivalled growth process analysis offers a compelling alternative to expensive calibration runs by enabling us to extract material parameters in-situ during production," he adds. 

"Our systems cover a complete range of thin-film applications, providing access to all significant thin-film growth parameters," says LayTec's chief technology officer Dr Kolja Haberland. 

See related items:

Accuracy of LayTec EpiTT Gen3's XRD-referenced nk database improved for InP-based materials

Tags: LayTec Metrology MOCVD IQE

Visit: www.iqep.com

Visit: www.laytec.de/GaAs

See Latest IssueRSS Feed