9 January 2018
Osram orders multi-reactor Propel HVM and K475i MOCVD systems from Veeco for high-volume photonics and LED applications
© Semiconductor Today Magazine / Juno Publishing
Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that Osram Opto Semiconductors GmbH of Regensburg, Germany has ordered a multi-reactor Propel High-Volume Manufacturing (HVM) gallium nitride (GaN) metal-organic chemical vapor deposition (MOCVD) system, as well as K475i MOCVD systems.
Introduced recently for high-volume production of power electronics, laser diodes, RF semiconductor devices and advanced LEDs, the Propel HVM platform is based on the Propel Power GaN MOCVD single-wafer system with proprietary IsoFlange and SymmHeat technologies that provide homogeneous laminar flow and uniform temperature profile across the entire wafer.
The K475i system incorporates Veeco’s Uniform FlowFlange technology, producing films with very high uniformity and improved within-wafer and wafer-to-wafer repeatability with what is claimed to be the industry’s lowest particle generation for demanding applications like photonics and advanced LEDs.
“The new Propel HVM system offers superior film quality, improved dopant control, robust production capabilities and the industry’s lowest cost of ownership to enable advanced electronic devices with greater energy efficiency, a smaller form factor and exceptional reliability,” says Peo Hansson Ph.D., senior VP & general manager of Veeco MOCVD Operations. “Osram’s purchase of multiple K475i systems is also evidence that Veeco’s MOCVD solutions meet the most demanding process requirements for automotive, advanced display and sensor applications,” he adds.
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