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9 April 2008


Veeco delivers GaN MOCVD reactors

Veeco Instruments Inc of Woodbury, NY, USA has delivered multiple TurboDisc K-Series gallium nitride metal-organic chemical vapor deposition (MOCVD) systems to Genesis Photonics Inc (GPI) of Southern Taiwan Science-Base Industrial Park, boosting its production capacity for GaN-based blue high-brightness LEDs (HB-LEDs) for lighting, display, backlighting, and automotive applications.

“The excellent throughput of the TurboDisc technology, plus the proven productivity of this platform in the LED industry in Taiwan, will meet our needs today and into the future,” says GPI’s chairman and CEO David Chung.

“The Turbodisc K-Series multi-generational platform and larger reactor capability will give GPI a long-term cost of ownership advantage, plus the technology to achieve their LED brightness roadmap objectives,” says Sam DiRenzo, VP, general manager of Veeco’s MOCVD operations.

Veeco claims that its TurboDisc K-Series MOCVD GaN platform (which includes the K300 and K465 models) delivers the industry’s highest throughput available for high -volume production of GaN-based blue and green LEDs and blue lasers.

See related items:

M-Com orders Veeco As/P MOCVD reactor

Asian HB-LED makers expanding with Veeco GaN systems

Veeco GaN MOCVD system accepted by Japanese HB-LED manufacturer

Veeco boosted by HB-LED and solar market

Search: Veeco TurboDisc MOCVD GaN LEDs Genesis Photonics

See: Veeco Company Profile