FREE subscription
Subscribe for free to receive each issue of Semiconductor Today magazine and weekly news brief.


5 January 2009


SMI licenses SiC MOCVD technology from Veeco

Structured Materials Industries Inc of Piscataway, NJ, USA, which provides metal-organic chemical vapor deposition (MOCVD) systems, components, materials, and process development services, says that it has licensed silicon carbide (SiC) MOCVD enabling technology from Veeco Instruments Inc of Plainview, NY, USA.

“SMI’s licensing of Veeco SiC MOCVD technology will greatly further and expand our efforts in helping to commercialize SiC MOCVD production tools,” says SMI’s president Dr Gary S. Tompa. “Over the past few years, SMI has made teamings for the development of SiC processes and dedicated device-enabling materials production tools,” he adds.

The firm is currently developing SiC production tools scaled at multiple sizes for 2”, 4”, and 6” diameter wafers. The tools are compatible with advanced processes featuring high and efficient deposition rates.

SMI says that SiC is the only solution for the highest-power and/or high-temperature devices in small packages. Applications include the solar, automotive and military sectors. The new SiC tool should help to enable this key industry, the firm adds.

See related items:

SMI receives order for GFHC-Linear150 sputter source

SiC electronics market to reach $800m by 2015

See: Veeco Company Profile

Search: SMI Veeco MOCVD SiC



Aixtron advert