26 July 2010


WEP installs wafer profiler at Aixtron’s Application Lab

WEP of Furtwangen im Schwarzwald, Germany says that second-quarter 2010 saw installation of its CVP21 electrochemical capacitance-voltage (ECV) wafer profiler in the R&D Application Laboratory of Aixtron AG in Aachen, which manufactures deposition equipment including metal-organic chemical vapor deposition (MOCVD) systems. Several deposition systems are operated at the Application Lab for test and development.

The CVP21 fully automates the entire measurement process for carrier concentration profiling (including fluid handling, movement of the electrochemical cell, in-situ imaging, and CV scan analysis) to yield reproducible results with high accuracy. The CVP21 monitors the quality of semiconductor layers and includes comprehensive self-calibration algorithms to achieve results with high reliability. It also contains a patented process for processing (Al,In)GaN samples in full-automation mode.

“Currently there is very strong demand for CVP21 equipment worldwide,” comments WEP’s president Thomas Wolff.

See related items:

FBH orders WEP CVP21 wafer ECV-profiler

Institute of Semiconductor Technology, University of Braunschweig orders CV wafer profiler from WEP

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