AES Semigas


12 August 2020

Germany’s IHP Microelectronics chooses Veeco TurboDisc MOCVD platform

Veeco Instruments Inc of Plainview, NY, USA says that its TurboDisc metal-organic chemical vapor deposition (MOCVD) platform has been selected by German government-funded research institute IHP Microelectronics of Frankfurt (Oder) for the development of high-performance, silicon-based microelectronic technologies. IHP has expertise in silicon-based systems, high-frequency integrated circuits, and technologies for wireless and broadband communication.

“Their selection of our TurboDisc platform is validation of its exceptional process capabilities and ability to help enable game-changing technologies,” says Veeco’s chief technology officer Ajit Paranjpe. “We look forward to continuing to support IHP as they continue to innovate and execute on their mission.”

The TurboDisc platform has been the foundation of Veeco’s decades of expertise in compound semiconductor materials science. The proprietary technology is a key enabler for demanding arsenide/phosphide (As/P) and gallium nitride (GaN) applications that are critical for next-generation communications infrastructure and highly efficient microelectronic devices. TurboDisc provides production ramping due to faster recipe capabilities up to 50% quicker than when using traditional batch tools. In addition, the platform also includes Veeco’s IsoFlange and SymmHeat technologies, which provide homogeneous laminar flow and uniform temperature profile across the entire wafer, delivering uniformity and repeatability.

Tags: Veeco MOCVD




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