16 October 2020
Veeco’s Propel HVM MOCVD platform chosen by Korea’s A-Pro
Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that A-Pro Semicon Co Ltd, a subsidiary of South Korea-based A-Pro’s semiconductor business, has chosen its Propel HVM metal-organic chemical vapor deposition (MOCVD) system for the development and production of gallium nitride (GaN)-based power semiconductor and 5G RF devices. The system was selected for its excellent uniformity, operational efficiency and proven performance for high-volume production, says Veeco.
“A-Pro Semicon is well positioned to grow in the diverse power semiconductor device market as well as expand and commercialize 5G RF technologies using GaN MOCVD technology,” reckons A-Pro Semicon’s CEO Jong-Hyun Lim Ph.D. “Veeco’s single-wafer Propel HVM platform has demonstrated the technical performance, flexibility and versatility we require to go after these markets. Furthermore, the Veeco team has shown outstanding collaboration and support throughout the buying process,” he adds.
The global GaN power device market was $100m in 2019 and is rising at a compound annual growth rate (CAGR) of 35% from 2020 to $1.2bn in 2027, reckons Allied Market Research. The decrease in prices of GaN devices, increase in demand for GaN devices for wireless charging, and rise in adoption of GaN devices in electric vehicles (EVs) have boosted growth, it adds. Additionally, an increase in GaN devices for commercial RF applications is augmenting the growth.
“A-Pro Semicon has selected our Propel HVM platform as their first MOCVD system to help grow their footprint in the GaN power semiconductor and 5G markets,” notes Veeco’s chief marketing officer Scott Kroeger. “Our Propel suite of systems has been well received by leading and ambitious technology companies such as A-Pro Semicon for its proven, high-performance capability and yield to drive critical technology megatrends such as power, 5G RF and photonics applications that are driving the future.”
Veeco says that its Propel HVM system offers a high-volume, single-wafer reactor configuration for GaN-based applications, with uniformity, repeatability and yield performance resulting from decades of production-scale expertise in GaN MOCVD technology. The system offers 200mm and 300mm configurations with up to six modular cluster chambers for maximum productivity and flexibility, suitable for foundries and integrated device manufacturers (IDMs).