AES Semigas


18 October 2022

Furukawa selects Aixtron’s AIX 2800G4 MOCVD system for opto device production

Deposition equipment maker Aixtron SE of Herzogenrath, near Aachen, Germany has received an order from Japan-based compound semiconductor device maker Furukawa Fitel Optical Device Co Ltd (FFOD) for an AIX 2800G4 metal-organic chemical vapor deposition (MOCVD) system, to be used for the development and the production of optoelectronic devices based on gallium arsenide (GaAs) and indium phosphide (InP) materials.

Aixtron claims that the AIX 2800G4 platform is the market-leading tool for the production of various semiconductor devices due to the performance of the Planetary Reactor concept with respect to thickness and wavelength uniformity control of epitaxial layers. The firm also claims that the proven system for high-volume manufacturing provides highest efficiency in the use of chemicals while delivering superior yields for most advanced optical devices due to wafer-level process control.

“We are very pleased to see Furukawa becoming one of our G4 users,” says Aixtron’s CEO & president Dr Felix Grawert. “With our team of hardware and process experts in Japan, we are looking forward to this new cooperation, supporting Furukawa to swiftly ramp up the platform for their existing and future products.”

Tags: Aixtron


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