AES Semigas


10 July 2023

OIPT ships full suite of plasma processing solutions to Indian Institute of Science

Oxford Instruments Plasma Technology (OIPT) of Yatton, near Bristol, UK has announced a shipment of equipment to the GaN Ecosystem Enabling Centre and Incubator (GEECI) located at the Centre for Nano Science and Engineering, (CeNSE) Indian Institute of Science (IISc), in Bengaluru.

To be installed in a pilot production line, the shipment includes atomic layer etch (ALE) equipment, two variants of inductively coupled plasma (ICP) etch modules, and plasma enhanced chemical vapour deposition (PECVD) technology. The suite of gallium nitride (GaN) plasma processing solutions will be used to develop next generation GaN-on-Si and GaN-on-SiC high power and high frequency power electronics and RF devices, says the firm.

Located within India’s premier high technology hub, in the city of Bengaluru, GEECI is an ideal environment for technology start-ups and spin-offs. Professor Srinivasan Raghavan (Vasu), who is in charge of setting up GEECI, said, “The equipment, ongoing process and service support, and technical collaboration with Oxford Instruments Plasma Technology is crucial to our GaN device development program. We are incredibly excited to partner with Oxford Instruments to establish our new GaN pilot production line to support the next generation of GaN startups and spin outs, which are critical to accelerate India’s flourishing semiconductor ecosystem. Prof. Shankar Kumar Selvaraja the Process expert added, “We look forward to developing new process recipes to enable GaN power and RF electronics”.

Ian Wright, OIPT’s VP of Sales and Business Development, Asia, commented “We are delighted to be bringing our GaN technology to such a prestigious institution as the IISc. We have recently experienced a surge in interest for our solutions in India, which points toward a shift in the technology landscape for that region with momentum generated through government funding.”




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