AES Semigas


17 July 2023

Oxford Instruments launches high-rate ALD research system

UK-based Oxford Instruments has launched the PlasmaPro ASP, a high-rate atomic layer deposition (ALD) research system within its Atomfab product range.

The PlasmaPro ASP benefits from a new patented remote-plasma source design, optimized chamber geometry and wafer stage bias for ion energy control. These features combine to deliver three times faster ALD rate, low resistivity and high-Tc superconducting nitride films for quantum technology, the initial application focus for the launch. The plasma source design involved a partnership with Eindhoven University of Technology (TU/e), which received a development module to study the plasma parameter space and confirm the high-rate low-damage source characteristics. The research paper published following the joint development work with TU/e was awarded best paper at the American Vacuum Society’s 22nd International Conference on Atomic Layer Deposition (AVS ALD/ALE 2022) conference.

Oxford Instruments’ collaboration with TU/e has continued through to process development, where TU/e has been serving as a PlasmaPro ASP application development accelerator for quantum and additional applications for the past year.

“This system is an excellent addition to our existing ALD tool set from Oxford Instruments, as it distinguishes itself in terms of productivity and plasma capability,” comments professor Erwin Kessels, chair of  Plasma & Materials Processing (PMP) group at TU/e. “Hence it provides some unique opportunities for our research in the field of electronics, photonics and quantum technology,” he adds.

“We have experienced high pre-launch interest from the market for the PlasmaPro ASP for superconducting quantum materials. The PlasmaPro ASP is designed to address key quantum challenges with an innovative high-rate source design and high machine up-time, as well as an intuitive software user interface called PTIQ,” says Dr Russ Renzas, Quantum Technologies market manager, Oxford Instruments Plasma Technology, Americas. “With the source design derived from our Atomfab ALD production product, the PlasmaPro ASP retains process speed and robustness, with the inclusion of additional hardware to increase flexibility, which offers a unique solution to the quantum market to speed up development cycles.”

Oxford Instruments is attending the American Vacuum Society’s 23rd International Conference on Atomic Layer Deposition (AVS ALD/ALE 2023) in Bellevue (East Seattle), WA, USA (23–26 July). The Oxford Instruments Plasma Technology team are available at the company’s booth to talk about the PlasmaPro ASP and share its latest atomic-scale processing solutions for quantum and other developing technologies.

Tags: OIPT




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