AES Semigas


19 April 2024

Wolfspeed orders multiple Aixtron G10-SiC systems to support ramp-up of 200mm epi production

Deposition equipment maker Aixtron SE of Herzogenrath, near Aachen, Germany says that in Q3 and Q4/2023 Wolfspeed Inc of Durham, NC, USA — which makes silicon carbide (SiC) materials and power semiconductor devices — placed multiple-tool orders to utilize its G10-SiC chemical vapor deposition (CVD) system to help further ramp up production for 200mm (8-inch) SiC epitaxial wafers.

“We’re pleased with the Aixtron team’s efforts to support the expansion of our 200mm silicon carbide epitaxy process,” says Wolfspeed’s chief technology officer Elif Balkas. “The company’s G10-SiC has proven to be a suitable, reliable tool that will support our high-volume production needs currently on the Durham campus and ultimately at our new 200mm materials factory, The John Palmour Manufacturing Center for Silicon Carbide (The JP).”

Aixtron says that its G10-SiC system, launched in September 2022, has become the tool of record for both 150mm and 200mm silicon carbide epitaxy. With the latest innovations, the system delivers what are claimed to be best-in-class uniformities combined with the highest productivity, stability in manufacturing, and the lowest cost of ownership.

“Wolfspeed has chosen our G10-SiC as part of their epitaxy solution plan for Durham and The JP, which will be the world’s largest 200mm SiC materials factory,” notes Aixtron’s CEO & president Dr Felix Grawert.

See related items:

Wolfspeed tops out construction of John Palmour Manufacturing Center for Silicon Carbide

Aixtron launches G10-SiC 200mm CVD system

Tags: Aixtron Wolfspeed




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