News: Suppliers
29 July 2024
Samco sells ICP-RIE etching systems to III-V Lab
Process equipment maker Samco Inc of Kyoto, Japan has sold two of its RIE-400iP inductively coupled plasma reactive-ion etch (ICP-RIE) systems to III-V Lab of Palaiseau, France (a Alcatel-Lucent, Thales and CEA-Leti joint venture dedicated to industrial R&D on III-V-based optoelectronic and microelectronic components). The systems will be used in ongoing projects aimed at enhancing the performance and integration of III-V semiconductors with silicon. The deal is a milestone for Samco as it continues to expand its presence in the European market.
Picture: Samco’s RIE-400iP inductively coupled plasma reactive-ion etch system.
The RIE-400iP is a load-lock ICP etching system designed to handle wafers with a diameter up to 100mm (4”). The HSTC (Hyper Symmetrical Tornado Coil) ICP source effectively delivers uniform, high-density plasma and ensures excellent etch profiles, it is claimed. Robust and reliable hardware aids process control, achieving high productivity for a wide range of etching applications, indium phosphide (InP), gallium nitride (GaN), gallium arsenide (GaAs) and silicon carbide (SiC).
“Dry etching is a key technological building block for the development of III-V semiconductor innovative devices,” notes III-V Lab research engineer Dr Alexandre Larrue. “The purchase of RIE-400iP ICP etching systems from Samco will allow III-V Lab to address new challenges in compound semiconductor manufacturing and reinforce both its R&D activities and its small-volume production.”
