News: Suppliers
18 September 2024
North Carolina State University orders scia’s ion beam etch system
Advanced ion beam and plasma process equipment provider scia Systems GmbH of Chemnitz, Germany has announced a sale of its scia Mill 200 system to the North Carolina State University (NCSU). The system will be used to process wide bandgap semiconductor materials such as silicon carbide and gallium nitride and will be installed in NCSU’s newly established regional hub, called “Commercial Leap Ahead for Wide Bandgap Semiconductors” (CLAWS).
“We are pleased that the NCSU is using ion beam equipment from scia Systems in its newly built regional innovation hub. Due to its fully reactive gas compatibility, the scia Mill 200 is the right choice to enable reactive etching processes with enhanced selectivity and rate in wide bandgap semiconductor materials” stated Dr. Michael Zeuner, CEO of scia Systems.
The scia Mill 200 provides high-precision etching of complex multilayer materials with excellent uniformity for wafer sizes up to 200 mm, says the firm. Typical applications are 2D and 3D structuring of magnetic memory (MRAM), sensors, MEMS, and compound semiconductors.
