AES Semigas


28 October 2020

Osram qualifies Veeco’s Lumina MOCVD system

Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that Osram Opto Semiconductors GmbH of Regensburg, Germany has qualified its Lumina metal-organic chemical vapor deposition (MOCVD) system for production of high-end LEDs and to drive the next generation of advanced photonic devices.

“The Lumina system has proven to set new standards in terms of productivity that will meet and exceed market requirements,” comments Osram Opto Semiconductors’ chief operating officer Lothar Mergili. “Veeco’s best-in-class MOCVD technology has been, and will continue to be, an enabling technology for us,” he adds.

“The new Lumina system is built on over 20 years of high-volume MOCVD expertise and carries on the proven performance of our core TurboDisc technology,” says Veeco’s chief marketing officer Scott Kroeger. “To enable the next generation of devices, leading-edge companies like Osram depend on superior film quality, exceptional uniformity and repeatability with unmatched cost of ownership.”

At the heart of the Lumina system is Veeco’s MOCVD TurboDisc technology, which is said to feature excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, the firm’s proprietary technology drives uniform injection and thermal control for thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high-quality arsenic phosphide (As/P) epitaxial layers on wafers up to 8-inches in diameter. The Lumina system allows users to customize their systems for maximum value in delivering IRED, LED, edge-emitting lasers and VCSELs in high-volume production, says Veeco.

See related items:

Veeco launches Lumina As/P MOCVD platform

Tags: Veeco MOCVD Osram





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