AES Semigas


1 February 2022

Veeco receives multi-tool order from opto component maker

Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that a leading manufacturer of optoelectronic components has ordered multiple Lumina metal-organic chemical vapor deposition (MOCVD) systems for the production of optoelectronic components for photonics applications. The customer currently operates multiple Veeco MOCVD platforms, as well as other Veeco technologies.

“Following a successful evaluation, the superior performance of the Lumina platform has now been fully validated with several follow-on-orders for use in high-volume manufacturing,” says Adrian Devasahayam Ph.D., Veeco’s senior VP, product management. “The Lumina system is built on over 20 years of high-volume MOCVD expertise and carries on the proven performance of our core TurboDisc technology,” he adds. “To enable advanced photonics devices, leading companies depend on superior film quality, exceptional uniformity, repeatability and low defectivity with unmatched cost of ownership that Lumina delivers.”

At the heart of the Lumina system is Veeco’s MOCVD TurboDisc technology, which features what is claimed to be excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform injection and thermal control for thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high-quality arsenic phosphide (As/P) epitaxial layers on wafers up to 8-inches in diameter. The Lumina system allows users to customize their systems for maximum value in delivering micro-LEDs, LEDs, edge-emitting lasers and vertical-cavity surface-emitting lasers (VCSELs) in high-volume production, says Veeco.

See related items:

Osram qualifies Veeco’s Lumina MOCVD system 

Veeco launches Lumina As/P MOCVD platform

Tags: Veeco MOCVD



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